Removal mechanism and surface quality of crystal...

Materials Science in Semiconductor Processing 2020 / 01 Vol. 105

Removal mechanism and surface quality of crystal semiconductor materials in scratching tests with Berkovich indenter

Zhang, Cheng, Zhu, Hongtao, Jiang, Zhaoliang, Huang, Chuanzhen, Wang, Jun
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Volume:
105
Language:
english
Journal:
Materials Science in Semiconductor Processing
DOI:
10.1016/j.mssp.2019.104746
Date:
January, 2020
File:
PDF, 3.03 MB
english, 2020
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