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Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
Krylov, Igor, Xu, Xianbin, Qi, Yuanshen, Weinfeld, Kamira, Korchnoy, Valentina, Eizenberg, Moshe, Ritter, DanVolume:
37
Language:
english
Journal:
Journal of Vacuum Science & Technology A
DOI:
10.1116/1.5109717
Date:
December, 2019
File:
PDF, 3.01 MB
english, 2019