Frost layer growth behavior under cryogenic conditions

Applied Thermal Engineering 2019 / 12 Vol. 163

Frost layer growth behavior under cryogenic conditions

Lee, Jaehwan, Jeong, Haijun, Kim, Dong Rip, Lee, Kwan-Soo
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Volume:
163
Language:
english
Journal:
Applied Thermal Engineering
DOI:
10.1016/j.applthermaleng.2019.114333
Date:
December, 2019
File:
PDF, 2.02 MB
english, 2019
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