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Influence on distance between substrate and target on the properties of CuO thin film prepared by DC reactive magnetron sputtering
Sangwaranatee, N.W., Sangwaranatee, N., Chananonnawathorn, C., Horprathum, M.Volume:
5
Year:
2018
Language:
english
Journal:
Materials Today: Proceedings
DOI:
10.1016/j.matpr.2018.02.037
File:
PDF, 383 KB
english, 2018