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Stable Sub-Loop Behavior in Ferroelectric Si-Doped HfO 2
Lee, Kyoungjun, Lee, Hyeon Jae, Lee, Tae Yoon, Lim, Hong Heon, Song, Myeong Seop, Yoo, Hyang Keun, Suh, Dong Ik, Lee, Jae Gil, Zhu, Zhongwei, Yoon, Alexander, MacDonald, Matthew R, Lei, Xinjian, Park,Language:
english
Journal:
ACS Applied Materials & Interfaces
DOI:
10.1021/acsami.9b12878
Date:
October, 2019
File:
PDF, 852 KB
english, 2019