Growth of ZnO:Al by atomic layer deposition: Deconvoluting...

Thin Solid Films 2019 / 11 Vol. 690

Growth of ZnO:Al by atomic layer deposition: Deconvoluting the contribution of hydrogen interstitials and crystallographic texture on the conductivity

Mauit, Ozhet, Caffrey, David, Ainabayev, Ardak, Kaisha, Aitkazy, Toktarbaiuly, Olzat, Sugurbekov, Yerzhigit, Sugurbekova, Gulnar, Shvets, Igor V., Fleischer, Karsten
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Volume:
690
Language:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2019.137533
Date:
November, 2019
File:
PDF, 1.94 MB
english, 2019
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