Hydrogenated amorphous silicon films deposited by electron...

Hydrogenated amorphous silicon films deposited by electron cyclotron resonance chemical vapor deposition at room temperature with different radio frequency chuck powers

Alvarez, Hugo da S., Silva, Audrey R., Cioldin, Frederico H., Espindola, Luana C.J., Diniz, José A.
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Volume:
690
Language:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2019.137534
Date:
November, 2019
File:
PDF, 3.08 MB
english, 2019
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