Conformal 3D Nanopatterning by Block Copolymer Lithography...

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ACS Nano 2019 / 10

Conformal 3D Nanopatterning by Block Copolymer Lithography with Vapor-Phase Deposited Neutral Adlayer

Yang, Geon Gug, Choi, Junhwan, Cha, Seung Keun, Lee, Gil Yong, Jin, Hyeong Min, Hwang, Ho Seong, Yun, Taeyeong, Kang, Juyeon, Han, Kyu Hyo, Kim, Jang Hwan, Choi, Hee Jae, Im, Sung Gap, Kim, Sang Ouk
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Language:
english
Journal:
ACS Nano
DOI:
10.1021/acsnano.9b05859
Date:
October, 2019
File:
PDF, 1.09 MB
english, 2019
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