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Surface and Coatings Technology 2019 / 10

Molecular dynamics simulation of Si and SiO2 reactive ion etching by fluorine-rich ion species

Capdos Tinacba, Erin Joy, Isobe, Michiro, Karahashi, Kazuhiro, Hamaguchi, Satoshi
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Language:
english
Journal:
Surface and Coatings Technology
DOI:
10.1016/j.surfcoat.2019.125032
Date:
October, 2019
File:
PDF, 4.93 MB
english, 2019
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