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Mitigating the Impact of Mask Absorber Error on Lithographic Performance by Lithography System Holistic Optimization
Sheng, Naiyuan, Li, Enze, Sun, Yiyu, Li, Tie, Li, Yanqiu, Wei, Pengzhi, Liu, LihuiVolume:
9
Language:
english
Journal:
Applied Sciences
DOI:
10.3390/app9071275
Date:
March, 2019
File:
PDF, 2.43 MB
english, 2019