Computational Study of Pattern Formationin UV Nanoimprint Lithography
Yasuda, Masaaki, Koyama, Masanori, Sakata, Reo, Shirai, Masamitsu, Kawata, Hiroaki, Hirai, YoshihikoVolume:
31
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.31.189
Date:
June, 2018
File:
PDF, 3.87 MB
2018