Contact Photolithography at Sub-Micrometer Scale Using a...

Micromachines 2019 / 08 Vol. 10; Iss. 8

Contact Photolithography at Sub-Micrometer Scale Using a Soft Photomask

Wu, Chun-Ying, Hsieh, Heng, Lee, Yung-Chun
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Volume:
10
Journal:
Micromachines
DOI:
10.3390/mi10080547
Date:
August, 2019
File:
PDF, 1.63 MB
2019
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