Low residual stress in hydrogenated amorphous silicon-carbon films deposited by low-temperature PECVD
Herrera-Celis, José, Reyes-Betanzo, Claudia, Gelvez-Lizarazo, Oscar, Arriaga, L.G., Itzmoyotl-Toxqui, AdriánJournal:
Journal of Materials Research and Technology
DOI:
10.1016/j.jmrt.2019.09.026
Date:
September, 2019
File:
PDF, 1.95 MB
2019