Abnormal redeposition of silicate from Si3N4 etching onto SiO2 surfaces in flash memory manufacturing
Teng, Kai-Wen, Tu, Sheng-Hung, Hu, Ssu-Wei, Huang, You-Xin, Sheng, Yu-Jane, Tsao, Heng-KwongLanguage:
english
Journal:
Journal of Materials Science
DOI:
10.1007/s10853-019-04119-x
Date:
October, 2019
File:
PDF, 3.11 MB
english, 2019