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Fluctuation electron microscopy on silicon amorphized at varying self ion-implantation conditions
Radić, Dražen, Hilke, Sven, Peterlechner, Martin, Posselt, Matthias, Bracht, HartmutVolume:
126
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.5107494
Date:
September, 2019
File:
PDF, 4.87 MB
english, 2019