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The properties of Cu films deposited by high rate magnetron sputtering from a liquid target
Bleykher, G.A., Yuryeva, A.V., Shabunin, A.S., Sidelev, D.V., Grudinin, V.A., Yuryev, Yu.N.Volume:
169
Journal:
Vacuum
DOI:
10.1016/j.vacuum.2019.108914
Date:
November, 2019
File:
PDF, 1.20 MB
2019