Interaction of copper organometallic precursors with...

Interaction of copper organometallic precursors with barrier layers of Ti, Ta and W and their nitrides: a first-principles molecular dynamics study

Eduardo Machado, Marcin Kaczmarski, Benoît Braida, Pablo Ordejón, Diwakar Garg, John Norman, Hansong Cheng
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Volume:
13
Language:
english
Pages:
4
DOI:
10.1007/s00894-007-0187-6
Date:
July, 2007
File:
PDF, 434 KB
english, 2007
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