Remote Plasma Atomic Layer Deposition of SiNx Using...

Applied Sciences 2019 / 08 Vol. 9; Iss. 17

Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma

Cho, Haewon, Lee, Namgue, Choi, Hyeongsu, Park, Hyunwoo, Jung, Chanwon, Song, Seokhwi, Yuk, Hyunwoo, Kim, Youngjoon, Kim, Jong-Woo, Kim, Keunsik, Choi, Youngtae, Park, Suhyeon, Kwon, Yurim, Jeon, Hyeo
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
9
Journal:
Applied Sciences
DOI:
10.3390/app9173531
Date:
August, 2019
File:
PDF, 4.39 MB
2019
Conversion to is in progress
Conversion to is failed