[IEEE 2019 International Conference on Simulation of...

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[IEEE 2019 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) - Udine, Italy (2019.9.4-2019.9.6)] 2019 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) - Surface Roughness Scattering in NEGF using self-energy formulation

Badami, Oves, Berrada, Salim, Carrillo-Nunez, Hamilton, Medina-Bailon, Cristina, Georgiev, Vihar, Asenov, Asen
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Year:
2019
Language:
english
DOI:
10.1109/SISPAD.2019.8870526
File:
PDF, 535 KB
english, 2019
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