![](/img/cover-not-exists.png)
[IEEE 2019 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) - Udine, Italy (2019.9.4-2019.9.6)] 2019 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) - Surface Roughness Scattering in NEGF using self-energy formulation
Badami, Oves, Berrada, Salim, Carrillo-Nunez, Hamilton, Medina-Bailon, Cristina, Georgiev, Vihar, Asenov, AsenYear:
2019
Language:
english
DOI:
10.1109/SISPAD.2019.8870526
File:
PDF, 535 KB
english, 2019