[IEEE 2019 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) - Udine, Italy (2019.9.4-2019.9.6)] 2019 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) - Influence of Accurate Electron Drift Velocity Modelling on the Electrical Characteristics in GaN-on-Si HEMTs
Reiser, Korbinian, Twynam, John, Eckl, Christian, Brech, Helmut, Weigel, RobertYear:
2019
Language:
english
DOI:
10.1109/sispad.2019.8870417
File:
PDF, 315 KB
english, 2019