On the Origin of the Large Remanent Polarization in La:HfO...

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Advanced Electronic Materials 2019 / 09

On the Origin of the Large Remanent Polarization in La:HfO 2

Schenk, Tony, Fancher, Chris M., Park, Min Hyuk, Richter, Claudia, Künneth, Christopher, Kersch, Alfred, Jones, Jacob L., Mikolajick, Thomas, Schroeder, Uwe
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Journal:
Advanced Electronic Materials
DOI:
10.1002/aelm.201900303
Date:
September, 2019
File:
PDF, 1.34 MB
2019
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