![](/img/cover-not-exists.png)
[IEEE 2019 42nd International Spring Seminar on Electronics Technology (ISSE) - Wroclaw, Poland (2019.5.15-2019.5.19)] 2019 42nd International Spring Seminar on Electronics Technology (ISSE) - Optimization of Cryogenic Deep Reactive Ion Etching Process for On-Chip Energy Storage
Prasek, Jan, Houska, David, Hrdy, Radim, Hubalek, Jaromir, Schmid, UlrichYear:
2019
Language:
english
DOI:
10.1109/isse.2019.8810293
File:
PDF, 811 KB
english, 2019