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Performance enhancement of the dual-metal gate In 0.53 Ga 0.47 As dopingless TFET by using a platinum metal strip insertion
Liu, Hu, Yang, Lin-An, Chen, Yao, Jin, Zhi, Hao, YueVolume:
58
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/1347-4065/ab3e5f
Date:
October, 2019
File:
PDF, 1.42 MB
english, 2019