High Rate Deposition of ZnO Film Using Improved DC Reactive...

Japanese Journal of Applied Physics 1979 / 01 Vol. 18; Iss. S1

High Rate Deposition of ZnO Film Using Improved DC Reactive Magnetron Sputtering Technique

Hata, Tomonobu, Minamikawa, Toshiharu, Noda, Etsuji, Morimoto, Osamu, Hada, Toshio
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Volume:
18
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAPS.18S1.219
Date:
January, 1979
File:
PDF, 921 KB
1979
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