Controlled gradual and local thinning of free-standing nanometer thick Si3N4 films using reactive ion etch
Guzel, Fatma Dogan, Pitchford, William H., Kaur, JaspreetLanguage:
english
Journal:
Microsystem Technologies
DOI:
10.1007/s00542-019-04645-3
Date:
October, 2019
File:
PDF, 1.28 MB
english, 2019