Controlled gradual and local thinning of free-standing...

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Controlled gradual and local thinning of free-standing nanometer thick Si3N4 films using reactive ion etch

Guzel, Fatma Dogan, Pitchford, William H., Kaur, Jaspreet
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Language:
english
Journal:
Microsystem Technologies
DOI:
10.1007/s00542-019-04645-3
Date:
October, 2019
File:
PDF, 1.28 MB
english, 2019
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