A characteristic improved technique and analysis with plasma treatment to the electrode on oxide-based resistive random access memory
Lin, Chih-Yang, Chang, Ting-Chang, Pan, Chih-Hung, Chen, Min-Chen, Xu, You-Lin, Wu, Pei-Yu, Chen, Chun-Kuei, Huang, Wei-Chen, Lin, Yun-Hsuan, Chao, Yu-Ting, Shou, Cheng-Yun, Ma, Xiao-Hua, Hao, Yue, SzLanguage:
english
Journal:
Journal of Alloys and Compounds
DOI:
10.1016/j.jallcom.2019.05.034
Date:
October, 2019
File:
PDF, 2.91 MB
english, 2019