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[IEEE 2019 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) - Udine, Italy (2019.9.4-2019.9.6)] 2019 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) - Simulation of Chemically Reacting Flow in Plasma Native Oxide Cleaning Process
Ryu, Seung-Min, Kim, Yunho, Pederson, Dylan, Lee, Jonghyun, Kim, Youngkwon, Raja, Laxminarayan L., Uh, Jiho, Choi, Sang-JinYear:
2019
DOI:
10.1109/sispad.2019.8870447
File:
PDF, 368 KB
2019