Effect of Ion-Beam Processing during RF Magnetron...

Semiconductors 2019 / 11 Vol. 53; Iss. 11

Effect of Ion-Beam Processing during RF Magnetron Sputtering on the properties of ZnO Films

Krylov, P. N., Alalykin, A. S., Durman, E. A., Zakirova, R. M., Fedotova, I. V.
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Volume:
53
Language:
english
Journal:
Semiconductors
DOI:
10.1134/S1063782619110095
Date:
November, 2019
File:
PDF, 2.33 MB
english, 2019
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