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Application of the Tersoff interatomic potential to pressure-induced polyamorphism of silicon
Mukuno, Renji, Ishimaru, ManabuVolume:
58
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/1347-4065/ab42f3
Date:
October, 2019
File:
PDF, 618 KB
english, 2019