[IEEE 2019 Silicon Nanoelectronics Workshop (SNW) - Kyoto,...

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[IEEE 2019 Silicon Nanoelectronics Workshop (SNW) - Kyoto, Japan (2019.6.9-2019.6.10)] 2019 Silicon Nanoelectronics Workshop (SNW) - The GAAFETs with Five Stacked Ge Nano-sheets Made by 2D Ge/Si Multilayer Epitaxy, Excellent Selective Etching, and Conformal Monolayer Doping

Chu, Chun-Lin, Luo, Guang-Li, Wu, Kehuey, Chen, Shih-Hong, Hsu, Chien-Chung, Chen, Bo-Yuan, Lin, Kun-Lin, Wu, Wen-Fa, Yeh, Wen-Kuan
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Year:
2019
Language:
english
DOI:
10.23919/SNW.2019.8782970
File:
PDF, 619 KB
english, 2019
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