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Nitrogen plasma treatment of a TiO2 layer for MIS ohmic contact on n-type Ge substrate
Yang, Jheng-Ci, Huang, Hsin-Fu, Li, Jyun-Han, Lee, Yao-Jen, Wang, Yeong-HerVolume:
171
Language:
english
Journal:
Vacuum
DOI:
10.1016/j.vacuum.2019.108996
Date:
January, 2020
File:
PDF, 1.60 MB
english, 2020