Nitrogen plasma treatment of a TiO2 layer for MIS ohmic...

Nitrogen plasma treatment of a TiO2 layer for MIS ohmic contact on n-type Ge substrate

Yang, Jheng-Ci, Huang, Hsin-Fu, Li, Jyun-Han, Lee, Yao-Jen, Wang, Yeong-Her
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
171
Language:
english
Journal:
Vacuum
DOI:
10.1016/j.vacuum.2019.108996
Date:
January, 2020
File:
PDF, 1.60 MB
english, 2020
Conversion to is in progress
Conversion to is failed