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15.1: Invited Paper: Effect of Cu Barrier Source/Drain Electrode on the Back‐Channel‐Etched High Mobility Oxide Thin‐Film Transistors
Park, Sang-Hee Ko, Kim, Daeho, Jeong, Wooseok, Lee, Seung-Hee, Winkler, Jörg, Schmidt, HennrikVolume:
50
Language:
english
Journal:
SID Symposium Digest of Technical Papers
DOI:
10.1002/sdtp.13418
Date:
September, 2019
File:
PDF, 909 KB
english, 2019