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Controlled gradual and local thinning of free-standing nanometer thick Si3N4 films using reactive ion etch
Guzel, Fatma Dogan, Pitchford, William H., Kaur, JaspreetJournal:
Microsystem Technologies
DOI:
10.1007/s00542-019-04645-3
Date:
October, 2019
File:
PDF, 1.28 MB
2019