Achieving ultralow surface roughness and high material...

Applied Surface Science 2020 / 01 Vol. 500

Achieving ultralow surface roughness and high material removal rate in fused silica via a novel acid SiO2 slurry and its chemical-mechanical polishing mechanism

Shi, Xiao-Lei, Chen, Gaopan, Xu, Li, Kang, Chengxi, Luo, Guihai, Luo, Haimei, Zhou, Yan, Dargusch, Matthew S., Pan, Guoshun
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Volume:
500
Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2019.144041
Date:
January, 2020
File:
PDF, 3.47 MB
2020
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