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[IEEE 2019 26th International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD) - Kyoto, Japan (2019.7.2-2019.7.5)] 2019 26th International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD) - Gate Insulator Influences on the Electrical Performance of Back-Channel-Etch Amorphous Zinc Tin Oxide (a-ZTO) Thin Film Transistors
Zuo, Hongyang, Zhang, Letao, Yang, Yukun, Fan, Changhui, Zhang, ShengdongYear:
2019
Language:
english
DOI:
10.23919/AM-FPD.2019.8830567
File:
PDF, 1.67 MB
english, 2019