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[AIP ION IMPLANTATION TECHNOLOGY: 17th International Conference on Ion Implantation Technology - Monterey (California) (8–13 June 2008)] AIP Conference Proceedings - Dopant Activation and Defect Analysis of Ultra-Shallow Junctions Made by Gas Cluster Ion Beams
Shao, Yan, Hautala, John, Larson, Larry, Jain, Amitabh, Seebauer, Edmund G., Felch, Susan B., Jain, Amitabh, Kondratenko, Yevgeniy V.Year:
2008
DOI:
10.1063/1.3033650
File:
PDF, 1.24 MB
2008