Isotropic silicon etch characteristics in a purely...

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 2019 / 11 Vol. 37; Iss. 6

Isotropic silicon etch characteristics in a purely inductively coupled SF 6 plasma

Panduranga, Parashara, Abdou, Aly, Ren, Zhong, Pedersen, Rasmus H., Nezhad, Maziar P.
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Volume:
37
Journal:
Journal of Vacuum Science & Technology B
DOI:
10.1116/1.5116021
Date:
November, 2019
File:
PDF, 2.60 MB
2019
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