Plasma-enhanced atomic layer deposition of gallium nitride...

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Ceramics International 2019 / 11

Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application

Qiu, Peng, Wei, Huiyun, An, Yunlai, Wu, Qixin, Du, Wenxin, Jiang, Zengxuan, Zhou, Lang, Gao, Chuang, Liu, Sanjie, He, Yingfeng, Song, Yimeng, Peng, Mingzeng, Zheng, Xinhe
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Journal:
Ceramics International
DOI:
10.1016/j.ceramint.2019.11.026
Date:
November, 2019
File:
PDF, 3.30 MB
2019
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