[IEEE 2019 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) - Hsinchu, Taiwan (2019.4.22-2019.4.25)] 2019 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) - Selective Atomic Layer Deposition of TiO 2
Ahles, Christopher, Choi, Jong, Wong, Keith, Nemani, Srinivas, Kummel, AndrewYear:
2019
Language:
english
DOI:
10.1109/vlsi-tsa.2019.8804682
File:
PDF, 884 KB
english, 2019