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ChemInform Abstract: IN SITU MONITORING OF FILM DEPOSITION USING HE-NE LASER SYSTEM PART 2, MEASUREMENTS OF POLYCRYSTALLINE SILICON FILM IN THE INFRARED
SUGAWARA, KATSURO, YOSHIMI, TAKEO, OKUYAMA, HIROAKI, HOMMA, YOSHIOVolume:
5
Journal:
Chemischer Informationsdienst
DOI:
10.1002/chin.197448016
Date:
December, 1974
File:
PDF, 122 KB
1974