Relationship between Resolution Blur and Stochastic Defect...

Journal of Photopolymer Science and Technology 2019 / 6 Vol. 32; Iss. 1

Relationship between Resolution Blur and Stochastic Defect of Chemically Amplified Resists Used for Extreme Ultraviolet Lithography

Kozawa, Takahiro, Santillan, Julius Joseph, Itani, Toshiro
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
32
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.32.161
Date:
June, 2019
File:
PDF, 564 KB
english, 2019
Conversion to is in progress
Conversion to is failed