Titanium(IV) isopropoxide as a source of titanium and oxygen atoms in carbon based coatings deposited by Radio Frequency Plasma Enhanced Chemical Vapour Deposition method
Jedrzejczak, Anna, Batory, Damian, Prowizor, Milena, Dominik, Magdalena, Smietana, Mateusz, Cichomski, Michal, Kisielewska, Aneta, Szymanski, Witold, Kozlowski, Witold, Dudek, MariuszJournal:
Thin Solid Films
DOI:
10.1016/j.tsf.2019.137697
Date:
November, 2019
File:
PDF, 947 KB
2019
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