Nano-scale residual stress depth profiling in Cu/W...

Surface and Coatings Technology 2019 / 11

Nano-scale residual stress depth profiling in Cu/W nano-multilayers as a function of magnetron sputtering pressure

Romano-Brandt, León, Salvati, Enrico, Le Bourhis, Eric, Moxham, Thomas, Dolbnya, Igor P., Korsunsky, Alexander M.
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Journal:
Surface and Coatings Technology
DOI:
10.1016/j.surfcoat.2019.125142
Date:
November, 2019
File:
PDF, 1.50 MB
2019
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