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Understanding the Mechanism of Electronic Defects Suppression Enabled by Non-Idealities in Atomic Layer Deposition
Kavrik, Mahmut S., Bostwick, Aaron, Rotenberg, Eli, Tang, Kechao, Thomson, Emily, Aoki, Toshihiro, Fruhberger, Bernd, Taur, Yuan, McIntyre, Paul C, Kummel, Andrew C.Journal:
Journal of the American Chemical Society
DOI:
10.1021/jacs.9b06640
Date:
November, 2019
File:
PDF, 2.31 MB
2019