[IEEE 2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Saratoga Springs, NY, USA (2019.5.6-2019.5.9)] 2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Characterization of Overlay and Tilt in Advanced Technology Nodes using Scatterometry
Dixit, Dhairya, Dey, Sonal, Kagalwala, Taher, Timoney, Padraig, Ramnath, Yudesh, Elia, Alexander, Paranjape, Ninad, Keller, Nick, Vaid, AlokYear:
2019
DOI:
10.1109/asmc.2019.8791810
File:
PDF, 2.53 MB
2019