Displacement Talbot lithography for nano-engineering of III-nitride materials
Coulon, Pierre-Marie, Damilano, Benjamin, Alloing, Blandine, Chausse, Pierre, Walde, Sebastian, Enslin, Johannes, Armstrong, Robert, Vézian, Stéphane, Hagedorn, Sylvia, Wernicke, Tim, Massies, Jean, ZVolume:
5
Journal:
Microsystems & Nanoengineering
DOI:
10.1038/s41378-019-0101-2
Date:
December, 2019
File:
PDF, 2.61 MB
2019