Controlled strong excitation of silicon as a step towards...

Communications Physics 2019 / 12 Vol. 2; Iss. 1

Controlled strong excitation of silicon as a step towards processing materials at sub-nanometer precision

Dinh, Thanh-Hung, Medvedev, Nikita, Ishino, Masahiko, Kitamura, Toshiyuki, Hasegawa, Noboru, Otobe, Tomohito, Higashiguchi, Takeshi, Sakaue, Kazuyuki, Washio, Masakazu, Hatano, Tadashi, Kon, Akira, Ku
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Volume:
2
Journal:
Communications Physics
DOI:
10.1038/s42005-019-0253-2
Date:
December, 2019
File:
PDF, 1.58 MB
2019
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