3D numerical study of the asymmetric phenomenon in 200 mm...

Journal of Crystal Growth 2020 / 02 Vol. 532

3D numerical study of the asymmetric phenomenon in 200 mm floating zone silicon crystal growth

Han, Xue-Feng, Liu, Xin, Nakano, Satoshi, Harada, Hirofumi, Miyamura, Yoshiji, Kakimoto, Koichi
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Volume:
532
Journal:
Journal of Crystal Growth
DOI:
10.1016/j.jcrysgro.2019.125403
Date:
February, 2020
File:
PDF, 322 KB
2020
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