CCl4-based reactive ion etching of semi-insulating GaAs and InP
Š. Haščík, P. Eliáš, J. Šoltýs, J. Martaus, I. HotovýVolume:
56
Language:
english
Pages:
1
DOI:
10.1007/s10582-006-0345-6
Date:
October, 2006
File:
PDF, 406 KB
english, 2006