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Plasma and Annealing Treatments to Form Height-Barrier Ni-Based Schottky Contact to n -GaN
Lee, Tae-Ju, Im, Hyeong-Seop, Seong, Tae-YeonVolume:
8
Year:
2019
Journal:
ECS Journal of Solid State Science and Technology
DOI:
10.1149/2.0121910jss
File:
PDF, 1008 KB
2019